Gen-Fab: A Variation-Aware Generative Model for Predicting Fabrication Variations in Nanophotonic Devices

ArXi:2603.11505v1 Announce Type: cross Silicon photonic devices often exhibit fabrication-induced variations such as over-etching, underetching, and corner rounding, which can significantly alter device performance. These variations are non-uniform and are influenced by feature size and shape. Accurate digital twins are therefore needed to predict the range of possible fabricated outcomes for a given design. In this paper, we